| |
| 2003 | ||
|---|---|---|
| 1 | EE | Clemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr: Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Trans. on CAD of Integrated Circuits and Systems 22(3): 285-292 (2003) |
| 1 | Clemens Heitzinger | [1] |
| 2 | Toshimitsu Ohmine | [1] |
| 3 | Wolfgang Pyka | [1] |
| 4 | Siegfried Selberherr | [1] |
| 5 | Toshiro Takase | [1] |