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Naoki Tamaoki

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2003
1EEClemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr: Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Trans. on CAD of Integrated Circuits and Systems 22(3): 285-292 (2003)

Coauthor Index

1Clemens Heitzinger [1]
2Toshimitsu Ohmine [1]
3Wolfgang Pyka [1]
4Siegfried Selberherr [1]
5Toshiro Takase [1]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)