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Toshimitsu Ohmine

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2003
1EEClemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr: Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Trans. on CAD of Integrated Circuits and Systems 22(3): 285-292 (2003)

Coauthor Index

1Clemens Heitzinger [1]
2Wolfgang Pyka [1]
3Siegfried Selberherr [1]
4Toshiro Takase [1]
5Naoki Tamaoki [1]

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