| 1994 |
|---|
| 4 | EE | Edward W. Scheckler,
Andrew R. Neureuther:
Models and algorithms for three-dimensional topography simulation with SAMPLE-3D.
IEEE Trans. on CAD of Integrated Circuits and Systems 13(2): 219-230 (1994) |
| 3 | EE | Kenny K. H. Toh,
Andrew R. Neureuther,
Edward W. Scheckler:
Algorithms for simulation of three-dimensional etching.
IEEE Trans. on CAD of Integrated Circuits and Systems 13(5): 616-624 (1994) |
| 1993 |
|---|
| 2 | EE | Edward W. Scheckler,
Nelson N. Tam,
Anton K. Pfau,
Andrew R. Neureuther:
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification.
IEEE Trans. on CAD of Integrated Circuits and Systems 12(9): 1345-1356 (1993) |
| 1992 |
|---|
| 1 | EE | Edward W. Scheckler,
Alexander S. Wong,
Robert K. Wang,
Goodwin R. Chin,
John R. Camagna,
Andrew R. Neureuther,
Robert W. Dutton:
A utility-based integrated system for process simulation.
IEEE Trans. on CAD of Integrated Circuits and Systems 11(7): 911-920 (1992) |
