| |
| 2003 | ||
|---|---|---|
| 2 | EE | F. Lime, G. Ghibaudo, B. Guillaumot: Charge trapping in SiO2/HfO2/TiN gate stack. Microelectronics Reliability 43(9-11): 1445-1448 (2003) |
| 2001 | ||
| 1 | F. Lime, G. Ghibaudo, G. Guégan: Stress induced leakage current at low field in ultra thin oxides. Microelectronics Reliability 41(9-10): 1421-1425 (2001) | |
| 1 | G. Ghibaudo | [1] [2] |
| 2 | G. Guégan | [1] |
| 3 | B. Guillaumot | [2] |