2005 | ||
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2 | EE | S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä: Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. Microelectronics Reliability 45(5-6): 949-952 (2005) |
1 | EE | S. Dueñas, H. Castán, H. García, J. Barbolla, E. San Andrés, I. Mártil, G. González-Díaz: On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD. Microelectronics Reliability 45(5-6): 978-981 (2005) |
1 | J. Aarik | [2] |
2 | E. San Andrés | [1] |
3 | J. Barbolla | [1] [2] |
4 | H. Castán | [1] [2] |
5 | S. Dueñas | [1] [2] |
6 | G. González-Díaz | [1] |
7 | K. Kukli | [2] |
8 | M. Leskelä | [2] |
9 | I. Mártil | [1] |
10 | M. Ritala | [2] |