M. Leskelä

2005
1	EE	S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä: Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. Microelectronics Reliability 45(5-6): 949-952 (2005)

Coauthor Index

1	J. Aarik	[1]
2	J. Barbolla	[1]
3	H. Castán	[1]
4	S. Dueñas	[1]
5	H. García	[1]
6	K. Kukli	[1]
7	M. Ritala	[1]