H. Castán

2005
2	EE	S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä: Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. Microelectronics Reliability 45(5-6): 949-952 (2005)
1	EE	S. Dueñas, H. Castán, H. García, J. Barbolla, E. San Andrés, I. Mártil, G. González-Díaz: On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD. Microelectronics Reliability 45(5-6): 978-981 (2005)

Coauthor Index

1	J. Aarik	[2]
2	E. San Andrés	[1]
3	J. Barbolla	[1] [2]
4	S. Dueñas	[1] [2]
5	H. García	[1] [2]
6	G. González-Díaz	[1]
7	K. Kukli	[2]
8	M. Leskelä	[2]
9	I. Mártil	[1]
10	M. Ritala	[2]