| |
| 2002 | ||
|---|---|---|
| 1 | EE | B. L. Yang, N. W. Cheung, S. Denholm, J. Shao, H. Wong, P. T. Lai, Y. C. Cheng: Ultra-shallow n+p junction formed by PH3 and AsH3 plasma immersion ion implantation. Microelectronics Reliability 42(12): 1985-1989 (2002) |
| 1 | Y. C. Cheng | [1] |
| 2 | N. W. Cheung | [1] |
| 3 | P. T. Lai | [1] |
| 4 | J. Shao | [1] |
| 5 | H. Wong | [1] |
| 6 | B. L. Yang | [1] |