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N. W. Cheung

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2002
1EEB. L. Yang, N. W. Cheung, S. Denholm, J. Shao, H. Wong, P. T. Lai, Y. C. Cheng: Ultra-shallow n+p junction formed by PH3 and AsH3 plasma immersion ion implantation. Microelectronics Reliability 42(12): 1985-1989 (2002)

Coauthor Index

1Y. C. Cheng [1]
2S. Denholm [1]
3P. T. Lai [1]
4J. Shao [1]
5H. Wong [1]
6B. L. Yang [1]

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