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2002 | ||
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1 | EE | B. L. Yang, N. W. Cheung, S. Denholm, J. Shao, H. Wong, P. T. Lai, Y. C. Cheng: Ultra-shallow n+p junction formed by PH3 and AsH3 plasma immersion ion implantation. Microelectronics Reliability 42(12): 1985-1989 (2002) |
1 | Y. C. Cheng | [1] |
2 | S. Denholm | [1] |
3 | P. T. Lai | [1] |
4 | J. Shao | [1] |
5 | H. Wong | [1] |
6 | B. L. Yang | [1] |