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L. Truong

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2005
2EEY. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell: Impact of nitrogen incorporation on interface states in (100)Si/HfO2. Microelectronics Reliability 45(5-6): 802-805 (2005)
1EEL. Truong, Y. G. Fedorenko, V. V. Afanasev, A. Stesmans: Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2. Microelectronics Reliability 45(5-6): 823-826 (2005)

Coauthor Index

1V. V. Afanasev [1] [2]
2Stephen A. Campbell [2]
3Y. G. Fedorenko [1] [2]
4A. Stesmans [1] [2]
5Z. Zhang [2]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)