| |
| 2005 | ||
|---|---|---|
| 2 | EE | Y. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell: Impact of nitrogen incorporation on interface states in (100)Si/HfO2. Microelectronics Reliability 45(5-6): 802-805 (2005) |
| 1 | EE | L. Truong, Y. G. Fedorenko, V. V. Afanasev, A. Stesmans: Admittance spectroscopy of traps at the interfaces of (100)Si with Al2O3, ZrO2, and HfO2. Microelectronics Reliability 45(5-6): 823-826 (2005) |
| 1 | Stephen A. Campbell | [2] |
| 2 | Y. G. Fedorenko | [1] [2] |
| 3 | A. Stesmans | [1] [2] |
| 4 | L. Truong | [1] [2] |
| 5 | Z. Zhang | [2] |