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| 2003 | ||
|---|---|---|
| 2 | EE | Y. S. Zheng, Q. Guo, Y. J. Su, P. D. Foo: Polymer residue chemical composition analysis and its effect on via contact resistance in dual damascene copper interconnects process integration. Microelectronics Journal 34(2): 109-113 (2003) |
| 1 | EE | Y. S. Zheng, Y. J. Su, B. Yu, P. D. Foo: Investigation of defect on copper bond pad surface in copper/low k process integration. Microelectronics Reliability 43(8): 1311-1316 (2003) |
| 1 | P. D. Foo | [1] [2] |
| 2 | Q. Guo | [2] |
| 3 | Y. J. Su | [1] [2] |
| 4 | B. Yu | [1] |