| |
| 1997 | ||
|---|---|---|
| 2 | EE | Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire: Advanced DUV photolithography in a pilot lineenvironment. IBM Journal of Research and Development 41(1&2): 21-38 (1997) |
| 1992 | ||
| 1 | Robert M. Booth Jr., Kurt A. Tallman, Timothy J. Wiltshire, Pui L. Yee: A statistical approach to quality control of non-normal lithographical overlay distributions. IBM Journal of Research and Development 36(5): 835-844 (1992) | |
| 1 | Christopher P. Ausschnitt | [2] |
| 2 | Robert M. Booth Jr. | [1] |
| 3 | Kurt A. Tallman | [1] |
| 4 | Allan C. Thomas | [2] |
| 5 | Pui L. Yee | [1] |