1997 | ||
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1 | EE | Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire: Advanced DUV photolithography in a pilot lineenvironment. IBM Journal of Research and Development 41(1&2): 21-38 (1997) |
1 | Christopher P. Ausschnitt | [1] |
2 | Timothy J. Wiltshire | [1] |