Christopher P. Ausschnitt
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1997
1
EE
Christopher P. Ausschnitt,
Allan C. Thomas
,
Timothy J. Wiltshire
: Advanced DUV photolithography in a pilot lineenvironment.
IBM Journal of Research and Development 41
(1&2): 21-38 (1997)
Coauthor
Index
1
Allan C. Thomas
[
1
]
2
Timothy J. Wiltshire
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
