2007 | ||
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1 | EE | M. A. J. van Gils, O. van der Sluis, G. Q. Zhang, J. H. J. Janssen, R. M. J. Voncken: Analysis of Cu/low-k bond pad delamination by using a novel failure index. Microelectronics Reliability 47(2-3): 179-186 (2007) |
1 | M. A. J. van Gils | [1] |
2 | J. H. J. Janssen | [1] |
3 | O. van der Sluis | [1] |
4 | G. Q. Zhang | [1] |