| |
| 2003 | ||
|---|---|---|
| 2 | EE | Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, Edward J. Nowak, David L. Harmon: Critical reliability challenges in scaling SiO2-based dielectric to its limit. Microelectronics Reliability 43(8): 1175-1184 (2003) |
| 2002 | ||
| 1 | EE | Ernest Y. Wu, Edward J. Nowak, Alex Vayshenker, Wing L. Lai, David L. Harmon: CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. IBM Journal of Research and Development 46(2-3): 287-298 (2002) |
| 1 | David L. Harmon | [1] [2] |
| 2 | Wing L. Lai | [1] [2] |
| 3 | Edward J. Nowak | [1] [2] |
| 4 | Jordi Suñé | [2] |
| 5 | Ernest Y. Wu | [1] [2] |