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| 2001 | ||
|---|---|---|
| 1 | EE | S. Strobel, Anton J. Bauer, Matthias Beichele, Heiner Ryssel: Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode in PMOS devices. Microelectronics Reliability 41(7): 1085-1088 (2001) |
| 1 | Anton J. Bauer | [1] |
| 2 | Matthias Beichele | [1] |
| 3 | Heiner Ryssel | [1] |