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| 2001 | ||
|---|---|---|
| 2 | EE | S. Strobel, Anton J. Bauer, Matthias Beichele, Heiner Ryssel: Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode in PMOS devices. Microelectronics Reliability 41(7): 1085-1088 (2001) |
| 1 | EE | Matthias Beichele, Anton J. Bauer, Heiner Ryssel: Reliability of ultrathin nitrided oxides grown in low pressure N2O ambient. Microelectronics Reliability 41(7): 1089-1092 (2001) |
| 1 | Anton J. Bauer | [1] [2] |
| 2 | Heiner Ryssel | [1] [2] |
| 3 | S. Strobel | [2] |