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2001 | ||
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1 | EE | C. Zhao, G. Roebben, H. Bender, E. Young, S. Haukka, M. Houssa, M. Naili, Stefan De Gendt, Marc M. Heyns, O. Van Der Biest: In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction. Microelectronics Reliability 41(7): 995-998 (2001) |
1 | H. Bender | [1] |
2 | O. Van Der Biest | [1] |
3 | Stefan De Gendt | [1] |
4 | S. Haukka | [1] |
5 | Marc M. Heyns | [1] |
6 | M. Houssa | [1] |
7 | M. Naili | [1] |
8 | E. Young | [1] |
9 | C. Zhao | [1] |