| |
| 2006 | ||
|---|---|---|
| 1 | EE | Y. C. Chou, D. Leung, R. Grundbacher, R. Lai, Q. Kan, P. H. Liu, D. Eng, T. Block, A. Oki: Gate metal interdiffusion induced degradation in space-qualified GaAs PHEMTs. Microelectronics Reliability 46(1): 24-40 (2006) |
| 1 | T. Block | [1] |
| 2 | Y. C. Chou | [1] |
| 3 | D. Eng | [1] |
| 4 | R. Grundbacher | [1] |
| 5 | Q. Kan | [1] |
| 6 | R. Lai | [1] |
| 7 | D. Leung | [1] |
| 8 | P. H. Liu | [1] |