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| 2003 | ||
|---|---|---|
| 1 | EE | M. Porti, S. Meli, M. Nafría, X. Aymerich: Pre-breakdown noise in electrically stressed thin SiO2 layers of MOS devices observed with C-AFM. Microelectronics Reliability 43(8): 1203-1209 (2003) |
| 1 | X. Aymerich | [1] |
| 2 | M. Nafría | [1] |
| 3 | M. Porti | [1] |