| |
| 2006 | ||
|---|---|---|
| 2 | EE | M. Y. Yan, K. N. Tu, A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy: A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects. Microelectronics Reliability 46(8): 1392-1395 (2006) |
| 2004 | ||
| 1 | EE | A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy: Electromigration behavior of dual-damascene Cu interconnects--Structure, width, and length dependences. Microelectronics Reliability 44(5): 747-754 (2004) |
| 1 | S. G. Mhaisalkar | [1] [2] |
| 2 | K. N. Tu | [2] |
| 3 | A. V. Vairagar | [1] [2] |
| 4 | M. Y. Yan | [2] |