2006 | ||
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1 | EE | M. Y. Yan, K. N. Tu, A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy: A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects. Microelectronics Reliability 46(8): 1392-1395 (2006) |
1 | Ahila Krishnamoorthy | [1] |
2 | S. G. Mhaisalkar | [1] |
3 | A. V. Vairagar | [1] |
4 | M. Y. Yan | [1] |