|  |  | 
| 2005 | ||
|---|---|---|
| 2 | EE | E. Miranda, J. Molina, Y. Kim, H. Iwai: Degradation of high-K LA2O3 gate dielectrics using progressive electrical stress. Microelectronics Reliability 45(9-11): 1365-1369 (2005) | 
| 2002 | ||
| 1 | EE | H. Iwai, S. Ohmi: Trend of CMOS downsizing and its reliability. Microelectronics Reliability 42(9-11): 1251-1258 (2002) | 
| 1 | Y. Kim | [2] | 
| 2 | E. Miranda | [2] | 
| 3 | J. Molina | [2] | 
| 4 | S. Ohmi | [1] |