2005 | ||
---|---|---|
2 | EE | E. Miranda, J. Molina, Y. Kim, H. Iwai: Degradation of high-K LA2O3 gate dielectrics using progressive electrical stress. Microelectronics Reliability 45(9-11): 1365-1369 (2005) |
2002 | ||
1 | EE | H. Iwai, S. Ohmi: Trend of CMOS downsizing and its reliability. Microelectronics Reliability 42(9-11): 1251-1258 (2002) |
1 | Y. Kim | [2] |
2 | E. Miranda | [2] |
3 | J. Molina | [2] |
4 | S. Ohmi | [1] |