| |
| 1991 | ||
|---|---|---|
| 2 | EE | Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991) |
| 1987 | ||
| 1 | EE | Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano: Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 403-409 (1987) |
| 1 | Masayuki Endo | [1] [2] |
| 2 | Sigeru Hayama | [2] |
| 3 | Kazushi Ikeda | [2] |
| 4 | Yojiro Mano | [1] |
| 5 | Noboru Nomura | [2] |
| 6 | Masaru Sasago | [1] [2] |
| 7 | Sadafumi Tomida | [2] |
| 8 | K. Tsuji | [1] |