1993 | ||
---|---|---|
2 | EE | Kenji Harafuji, Akio Misaka, Noboru Nomura, Masahiro Kawamoto, Hirohiko Yamashita: A novel hierarchical approach for proximity effect correction in electron beam lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 12(10): 1508-1514 (1993) |
1991 | ||
1 | EE | Yoshihiko Hirai, Sadafumi Tomida, Kazushi Ikeda, Masaru Sasago, Masayuki Endo, Sigeru Hayama, Noboru Nomura: Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). IEEE Trans. on CAD of Integrated Circuits and Systems 10(6): 802-807 (1991) |
1 | Masayuki Endo | [1] |
2 | Kenji Harafuji | [2] |
3 | Sigeru Hayama | [1] |
4 | Yoshihiko Hirai | [1] |
5 | Kazushi Ikeda | [1] |
6 | Masahiro Kawamoto | [2] |
7 | Akio Misaka | [2] |
8 | Masaru Sasago | [1] |
9 | Sadafumi Tomida | [1] |
10 | Hirohiko Yamashita | [2] |