| |
| 1987 | ||
|---|---|---|
| 1 | EE | Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, K. Tsuji, Yojiro Mano: Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 403-409 (1987) |
| 1 | Masayuki Endo | [1] |
| 2 | Yoshihiko Hirai | [1] |
| 3 | Masaru Sasago | [1] |
| 4 | K. Tsuji | [1] |