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D. Davazoglou

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2005
2EEV. Em. Vamvakas, D. Davazoglou: Influence of the annealing temperature on the IR properties of SiO2 films grown from SiH4+O2. Microelectronics Reliability 45(5-6): 986-989 (2005)
1EEM. Vasilopoulou, A. M. Douvas, D. Kouvatsos, P. Argitis, D. Davazoglou: Characterization of various insulators for possible use as low-k dielectrics deposited at temperatures below 200degreeC. Microelectronics Reliability 45(5-6): 990-993 (2005)

Coauthor Index

1P. Argitis [1]
2A. M. Douvas [1]
3D. Kouvatsos [1]
4V. Em. Vamvakas [2]
5M. Vasilopoulou [1]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)