| |
| 2005 | ||
|---|---|---|
| 1 | EE | Terence B. Hook, Ronald J. Bolam, William Clark, Jay S. Burnham, Nivo Rovedo, Laura Schutz: Negative bias temperature instability on three oxide thicknesses (1.4/2.2/5.2 nm) with nitridation variations and deuteration. Microelectronics Reliability 45(1): 47-56 (2005) |
| 1 | Ronald J. Bolam | [1] |
| 2 | Jay S. Burnham | [1] |
| 3 | William Clark | [1] |
| 4 | Terence B. Hook | [1] |
| 5 | Nivo Rovedo | [1] |