| |
| 1998 | ||
|---|---|---|
| 1 | EE | Walter Bohmayr, Alexander Burenkov, Jürgen Lorenz, Heiner Ryssel, Siegfried Selberherr: Monte Carlo simulation of silicon amorphization during ion implantation. IEEE Trans. on CAD of Integrated Circuits and Systems 17(12): 1236-1243 (1998) |
| 1 | Alexander Burenkov | [1] |
| 2 | Jürgen Lorenz | [1] |
| 3 | Heiner Ryssel | [1] |
| 4 | Siegfried Selberherr | [1] |