| |
| 2001 | ||
|---|---|---|
| 1 | EE | A. Teramoto, H. Umeda, K. Azamawari, K. Kobayashi, K. Shiga, J. Komori, Y. Ohno, A. Shigetomi: Time-dependent dielectric breakdown of SiO2 films in a wide electric field range. Microelectronics Reliability 41(1): 47-52 (2001) |
| 1 | K. Kobayashi | [1] |
| 2 | J. Komori | [1] |
| 3 | Y. Ohno | [1] |
| 4 | K. Shiga | [1] |
| 5 | A. Shigetomi | [1] |
| 6 | A. Teramoto | [1] |
| 7 | H. Umeda | [1] |