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| 2005 | ||
|---|---|---|
| 1 | EE | John S. Suehle, B. Zhu, Y. Chen, Joseph B. Bernstein: Detailed study and projection of hard breakdown evolution in ultra-thin gate oxides. Microelectronics Reliability 45(3-4): 419-426 (2005) |
| 1 | Joseph B. Bernstein | [1] |
| 2 | Y. Chen | [1] |
| 3 | John S. Suehle | [1] |