| |
| 2005 | ||
|---|---|---|
| 2 | EE | John S. Suehle, B. Zhu, Y. Chen, Joseph B. Bernstein: Detailed study and projection of hard breakdown evolution in ultra-thin gate oxides. Microelectronics Reliability 45(3-4): 419-426 (2005) |
| 2002 | ||
| 1 | EE | John S. Suehle: Ultra-thin Gate Oxide Reliability and Implications for Design (Tutorial Abstract). ISQED 2002: 9 |
| 1 | Joseph B. Bernstein | [2] |
| 2 | Y. Chen | [2] |
| 3 | B. Zhu | [2] |