| |
| 2005 | ||
|---|---|---|
| 2 | EE | Nian Zhan, M. C. Poon, Hei Wong, K. L. Ng, C. W. Kok: Dielectric breakdown characteristics and interface trapping of hafnium oxide films. Microelectronics Journal 36(1): 29-33 (2005) |
| 2003 | ||
| 1 | EE | K. L. Ng, Nian Zhan, C. W. Kok, M. C. Poon, Hei Wong: Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectronics Reliability 43(8): 1289-1293 (2003) |
| 1 | C. W. Kok | [1] [2] |
| 2 | K. L. Ng | [1] [2] |
| 3 | M. C. Poon | [1] [2] |
| 4 | Hei Wong | [1] [2] |