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2005 | ||
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1 | EE | Vidya Kaushik, Martine Claes, Annelies Delabie, Sven Van Elshocht, Olivier Richard, Thierry Conard, Erika Rohr, Thomas Witters, Matty Caymax, Stefan De Gendt: Observation and characterization of defects in HfO2 high-K gate dielectric layers. Microelectronics Reliability 45(5-6): 798-801 (2005) |
1 | Matty Caymax | [1] |
2 | Martine Claes | [1] |
3 | Thierry Conard | [1] |
4 | Annelies Delabie | [1] |
5 | Sven Van Elshocht | [1] |
6 | Stefan De Gendt | [1] |
7 | Vidya Kaushik | [1] |
8 | Olivier Richard | [1] |
9 | Erika Rohr | [1] |