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| 2005 | ||
|---|---|---|
| 1 | EE | Vidya Kaushik, Martine Claes, Annelies Delabie, Sven Van Elshocht, Olivier Richard, Thierry Conard, Erika Rohr, Thomas Witters, Matty Caymax, Stefan De Gendt: Observation and characterization of defects in HfO2 high-K gate dielectric layers. Microelectronics Reliability 45(5-6): 798-801 (2005) |
| 1 | Matty Caymax | [1] |
| 2 | Martine Claes | [1] |
| 3 | Thierry Conard | [1] |
| 4 | Annelies Delabie | [1] |
| 5 | Stefan De Gendt | [1] |
| 6 | Vidya Kaushik | [1] |
| 7 | Olivier Richard | [1] |
| 8 | Erika Rohr | [1] |
| 9 | Thomas Witters | [1] |