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Tahui Wang

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2005
2EEM. H. Lin, Y. L. Lin, K. P. Chang, K. C. Su, Tahui Wang: Copper interconnect electromigration behaviors in various structures and lifetime improvement by cap/dielectric interface treatment. Microelectronics Reliability 45(7-8): 1061-1078 (2005)
1993
1EETahui Wang, Sheng-Jyh Wu, Chimoon Huang: Device and circuit simulation of anomalous DX trap effects in DCFL and SCFL HEMT inverters. IEEE Trans. on CAD of Integrated Circuits and Systems 12(11): 1758-1761 (1993)

Coauthor Index

1K. P. Chang [2]
2Chimoon Huang [1]
3M. H. Lin [2]
4Y. L. Lin [2]
5K. C. Su [2]
6Sheng-Jyh Wu [1]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)