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2005 | ||
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2 | EE | M. H. Lin, Y. L. Lin, K. P. Chang, K. C. Su, Tahui Wang: Copper interconnect electromigration behaviors in various structures and lifetime improvement by cap/dielectric interface treatment. Microelectronics Reliability 45(7-8): 1061-1078 (2005) |
1993 | ||
1 | EE | Tahui Wang, Sheng-Jyh Wu, Chimoon Huang: Device and circuit simulation of anomalous DX trap effects in DCFL and SCFL HEMT inverters. IEEE Trans. on CAD of Integrated Circuits and Systems 12(11): 1758-1761 (1993) |
1 | K. P. Chang | [2] |
2 | Chimoon Huang | [1] |
3 | M. H. Lin | [2] |
4 | Y. L. Lin | [2] |
5 | K. C. Su | [2] |
6 | Sheng-Jyh Wu | [1] |