K. C. Su

2005
2	EE	M. H. Lin, Y. L. Lin, K. P. Chang, K. C. Su, Tahui Wang: Copper interconnect electromigration behaviors in various structures and lifetime improvement by cap/dielectric interface treatment. Microelectronics Reliability 45(7-8): 1061-1078 (2005)
2002
1		H. K. Dai, K. C. Su: Locality Performance of Some Mesh-indexings. PDPTA 2002: 1337-1343

Coauthor Index

1	K. P. Chang	[2]
2	H. K. Dai	[1]
3	M. H. Lin	[2]
4	Y. L. Lin	[2]
5	Tahui Wang	[2]

Colors in the list of coauthors