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| 2005 | ||
|---|---|---|
| 1 | EE | M. Nelhiebel, J. Wissenwasser, Th. Detzel, A. Timmerer, E. Bertagnolli: Hydrogen-related influence of the metallization stack on characteristics and reliability of a trench gate oxide. Microelectronics Reliability 45(9-11): 1355-1359 (2005) |
| 1 | E. Bertagnolli | [1] |
| 2 | Th. Detzel | [1] |
| 3 | M. Nelhiebel | [1] |
| 4 | J. Wissenwasser | [1] |