J. K. O. Sin

2003
1	EE	David C. T. Or, P. T. Lai, J. K. O. Sin, Paul C. K. Kwok, J. P. Xu: Enhanced reliability for low-temperature gate dielectric of MOS devices by N2O or NO plasma nitridation. Microelectronics Reliability 43(1): 163-166 (2003)

Coauthor Index

1	Paul C. K. Kwok	[1]
2	P. T. Lai	[1]
3	David C. T. Or	[1]
4	J. P. Xu	[1]