D. G. Schlom

2005
1	EE	Gerald Lucovsky, J. G. Hong, C. C. Fulton, N. A. Stoute, Y. Zou, R. J. Nemanich, D. E. Aspnes, H. Ade, D. G. Schlom: Conduction band states of transition metal (TM) high-k gate dielectrics as determined from X-ray absorption spectra. Microelectronics Reliability 45(5-6): 827-830 (2005)

Coauthor Index

1	H. Ade	[1]
2	D. E. Aspnes	[1]
3	C. C. Fulton	[1]
4	J. G. Hong	[1]
5	Gerald Lucovsky	[1]
6	R. J. Nemanich	[1]
7	N. A. Stoute	[1]
8	Y. Zou	[1]