John F. Rembetski
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1992
1
Gottlieb S. Oehrlein
, John F. Rembetski: Plasma-based dry etching techniques in the silicon integrated circuit technology.
IBM Journal of Research and Development 36
(2): 140-157 (1992)
Coauthor
Index
1
Gottlieb S. Oehrlein
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Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)