| |
| 1993 | ||
|---|---|---|
| 1 | EE | Kenji Harafuji, Akio Misaka, Noboru Nomura, Masahiro Kawamoto, Hirohiko Yamashita: A novel hierarchical approach for proximity effect correction in electron beam lithography. IEEE Trans. on CAD of Integrated Circuits and Systems 12(10): 1508-1514 (1993) |
| 1 | Kenji Harafuji | [1] |
| 2 | Masahiro Kawamoto | [1] |
| 3 | Akio Misaka | [1] |
| 4 | Noboru Nomura | [1] |