| |
| 2001 | ||
|---|---|---|
| 2 | EE | Koji Eriguchi, Yoshinao Harada, Masaaki Niwa: Effects of base layer thickness on reliability of CVD Si3N4 stack gate dielectrics. Microelectronics Reliability 41(4): 587-595 (2001) |
| 1 | EE | Takayuki Yamada, Masaru Moriwaki, Yoshinao Harada, Shinji Fujii, Koji Eriguchi: Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. Microelectronics Reliability 41(5): 697-704 (2001) |
| 1 | Koji Eriguchi | [1] [2] |
| 2 | Shinji Fujii | [1] |
| 3 | Masaru Moriwaki | [1] |
| 4 | Masaaki Niwa | [2] |
| 5 | Takayuki Yamada | [1] |