| |
| 2007 | ||
|---|---|---|
| 2 | EE | Kirsten Weide-Zaage, David Dalleau, Yves Danto, Hélène Frémont: Dynamic void formation in a DD-copper-structure with different metallization geometry. Microelectronics Reliability 47(2-3): 319-325 (2007) |
| 2003 | ||
| 1 | EE | David Dalleau, Kirsten Weide-Zaage, Yves Danto: Simulation of time depending void formation in copper, aluminum and tungsten plugged via structures. Microelectronics Reliability 43(9-11): 1821-1826 (2003) |
| 1 | Yves Danto | [1] [2] |
| 2 | Hélène Frémont | [2] |
| 3 | Kirsten Weide-Zaage | [1] [2] |