| |
| 2005 | ||
|---|---|---|
| 2 | EE | Muthukkumar S. Kadavasal, Abhijit Chandra, Sutee Eamkajornsiri, Ashraf-F. Bastawros: Yield improvement via minimisation of step height non-uniformity in chemical mechanical planarisation (CMP) with pressure and velocity as control variables. IJMTM 7(5/6): 467-489 (2005) |
| 1 | EE | Changxue Wang, Peter Sherman, Abhijit Chandra: Modelling and analysis of pad surface topography and slurry particle size distribution effects on material removal rate in chemical mechanical planarisation. IJMTM 7(5/6): 504-529 (2005) |
| 1 | Ashraf-F. Bastawros | [2] |
| 2 | Sutee Eamkajornsiri | [2] |
| 3 | Muthukkumar S. Kadavasal | [2] |
| 4 | Peter Sherman | [1] |
| 5 | Changxue Wang | [1] |