| |
| 2003 | ||
|---|---|---|
| 1 | EE | Jackie Chan, Hei Wong, M. C. Poon, C. W. Kok: Oxynitride gate dielectric prepared by thermal oxidation of low-pressure chemical vapor deposition silicon-rich silicon nitride. Microelectronics Reliability 43(4): 611-616 (2003) |
| 1 | C. W. Kok | [1] |
| 2 | M. C. Poon | [1] |
| 3 | Hei Wong | [1] |