| |
| 2001 | ||
|---|---|---|
| 1 | EE | B. Lanchava, P. Baumgartner, A. Martin, A. Beyer, E. Mueller: Oxide reliability: influence of interface roughness, structure layout, and depletion layer formation. Microelectronics Reliability 41(7): 1097-1100 (2001) |
| 1 | A. Beyer | [1] |
| 2 | B. Lanchava | [1] |
| 3 | A. Martin | [1] |
| 4 | E. Mueller | [1] |