J. Yota

2004
1	EE	H. Zhou, F. G. Shi, B. Zhao, J. Yota: Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films. Microelectronics Journal 35(7): 571-576 (2004)

Coauthor Index

1	F. G. Shi	[1]
2	B. Zhao	[1]
3	H. Zhou	[1]